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From June 18th -19th 2015 Empa is hosting together with experts from the US National Institute of Standards and Technology (NIST) a 2-day workshop for PhD students and postdocs titled "Cause and Effect Analysis - A new approach for developing robust nano-bio assays".
The objective of this workshop is to teach participants the skills to develop robust nano-bio assays for evaluating the potential applications or implications of engineered nanomaterials (ENMs). This will be accomplished by teaching principles of measurement science in assay design, interlaboratory comparisons, and key issues for nano-bio measurements. Participants will gain experience developing assays by working in breakout groups to analyse several common assays using the versatile cause-and-effect analysis, to design control experiments to assess assay performance and uncertainties of key processes, and to refine protocols for each of the assays.
Meeting Outcomes and Goals
- Educate participants about strategies for designing high-quality assays
- Raise awareness about how to identify sources of variability and how to design experiments to quantify variability in the assay
- Generate candidate protocols that emphasize process control measurements to ensure comparability and high data quality
- A publication that summarizes the results and lessons learned from the workshop
More information on the workshop, location and accommodation can found in the programme flyer (PDF; 250 KB)
WHEN: 18.-19. June 2015
WHERE: Lerchenfeldstrasse 5, Empa, St.Gallen - Switzerland
Registration:
The Registration Fee for the 2-day workshop is €150 for PhD Students & Postdocs (€250 after April 10th 2015), and €650 for Academic & industrial researchers (€750 after April 10th 2015). There is a limited number of places for the workshop (25), therefore please use the Online-Registration form via the following link http://www.amiando.com/cea.html
Contact
Dr. Matthias Rösslein
Empa – Materials Science & Technology, St. Gallen Switzerland
Tel.: +41 58 765 7784
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.
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